Badril Azhar, Artik Elisa Angkawijaya, Shella Permatasari Santoso, Chintya Gunarto, Aning Ayucitra, Alchris Woo Go, Phuong Lan Tran-Nguyen, Suryadi Ismadji, Yi-Hsu Ju
A greener route to synthesize mesoporous copper–gallic acid metal–organic framework (CuGA MOF) than the conventional method using harmful DMF solvent was proposed in this study. Various synthesis attempts were conducted by modifying the synthesis conditions to produce CuGA MOF with comparable physical properties to a reference material (DMF-synthesized CuGA NMOF). The independent variables investigated include the molar ratio of NaOH to GA (1.1 to 4.4) and the synthesis temperature (30, 60, 90 °C). It was found that proper NaOH addition was crucial for suppressing the generation of copper oxide while maximizing the formation of CuGA MOF. On the other hand, the reaction temperature mainly affected the stability and adsorption potential of CuGA MOF. Reacting Cu, GA, and NaOH at a molar ratio of 1:1:2.2 and a temperature of 90 °C, produced mesoporous MOF (CuGA 90–2.2) with a surface area of 198.22 m2/g, a pore diameter of 8.6 nm, and a thermal stability of 219 °C. This MOF exhibited an excellent adsorption capacity for the removal of methylene blue (124.64 mg/g) and congo red (344.54 mg/g). The potential usage of CuGA 90–2.2 as a reusable adsorbent was demonstrated by its high adsorption efficiency (> 90%) after 5 adsorption–desorption cycles. © 2020, The Author(s).
Department of Chemical Engineering, National Taiwan University of Science and Technology, #43, Sec. 4, Keelung Rd., Taipei, 106, Taiwan; Graduate Institute of Applied Science and Technology, National Taiwan University of Science and Technology, #43, Sec. 4, Keelung Rd., Taipei, 106, Taiwan; Department of Chemical Engineering, Widya Mandala Surabaya Catholic University, Kalijudan 37, Surabaya, 60133, Indonesia; Department of Mechanical Engineering, Can Tho University, Campus II, 3/2 street, Can Tho city, 900100, Viet Nam; Taiwan Building Technology Center, National Taiwan University of Science and Technology, #43, Sec. 4, Keelung Rd., Taipei, 106, Taiwan